Research departments



MIMENTO Centre owns two machines enabling the fabrication of submicronic structures. Electron beam lithography enables to nanostructure electron beam resists whereas Focused Ion Beam (FIB) enables to perform localised etchings by means of an ion beam with a very high accuracy.

Bâti de gravure ionique focalisée (FIB), ORSAY PHYSICS

Focused Ionic Beam etching: FIB, ORSAY PHYSICS


Electron beam lithography Raith E_Line