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Oxidation furnace: TEMPRESS OMEGA junior


Oxidation furnace: TEMPRESS OMEGA junior
Four à oxydation TEMPRESS OMEGA junior

Characteristics:

the oxidation is performed by an oxidazing gas reaction on a silicon surface at high temperature (800 – 1150°C); wet oxidation: Si 2H2O(gaz) -> SiO2 2H2; maximum temperature: 1300°C; gas: O2 (sparging)