FEMTO-ST-Franche Comté Electronique Mécanique Thermique et Optique - Sciences et Technologies
Characteristics:
the oxidation is performed by an oxidazing gas reaction on a silicon surface at high temperature (800 – 1150°C); wet oxidation: Si 2H2O(gaz) -> SiO2 2H2; maximum temperature: 1300°C; gas: O2 (sparging)