Research departments

Deposition and thermal treatments


Deposition and thermal treatments


At FEMTO-ST, five techniques of metallic / dielectric layer deposition are available :

  • by PVD techniques (Physical Vapor Deposition) : Sputtering and Evaporation 
  • by CVD technique (Chemical Vapor Deposition) assisted by plasma : PECVD
  • by Electroplating
  • by wet and dry Oxidation

Photo-Dépôt



Equipments :



Cathode sputtering

PULVERISATION DC : PLASSYS
PULVERISATION REACTIVE D'ALN : PLASSYS
Pulvérisation Cathodique PLASSYS
Pulvérisation (CREST)



Evaporation

Evaporation à canon à électrons pour couche mince optique



PECVD

Equipement PECVD Sentech



Electroplating

Paillasse d'électroformage (Ni-Cu-Au)



Oxidation and Thermal treatments

Photo_Four triple tube


Contact :

cyril.millon@femto-st.fr