Research departments

PLASSYS Cathode sputtering / Evaporation


PLASSYS Cathode sputtering / Evaporation : Plassys MP 400

Pulvérisation Cathodique PLASSYS


Contact :

Alexandru TODORAN
TEMIS Sciences Building – Office N1-21
03 81 66 66 47 (Office)
03 63 08 23 77 (Deposition Area)
alexandru.todoran@femto-st.fr


Location :

TEMIS cleanroom
Deposition Area






Technical characteristics :

- Cathodes : three 4 inch magnetron cathodes (sputter up)
- Heating chuck (up to 450°C)
- Joule effect evaporation source

Deposited materials :

- Available targets : Cr, Au, Al, Ti, W and Cu
- Alloy : Ni-Cr 50-50, AU4G (Al-Cu-Mg-Si alloy)

Examples :

- Au-Cr deposition for quartz wet etching
- W deposition (refractory material) for thermocouple