Research departments

Dry and Wet Etching


Dry and Wet Etching



MIMENTO technology centre has a resource dedicated to the etching of differents materials by dry or wet etching. By choosing the appropriate reactive gases, a wide range of materials can be thus etched (Silicon, Quartz, Glass, LiNbO3..). Also, a wide range of etchants is available for more or less selective wet etching at ambient or thermostated baths.

• Dry Etching

Photo_Gravure



List of the materials etched by plasma at MIMENTO :

Tableau des matériaux gravés



Equipments :

Bâti de gravure profonde DRIE, ALCATEL
Photo Equipement RAPIER SPTS
STS5
Bâti de gravure ionique réactive fluoré PLASSYS
Equipement Nanoplas



• Wet Etching

Phot_Gravure chimie



Equipments :

Paillasse d'usinage humide (KOH + BHF) (CTMN)
Paillasse de Si poreux
Photo_Equipement Vapeur HF_1


Contact :

Dry Etching : djaffar.belharet@femto-st.fr

Wet Etching : laurent.robert@femto-st.fr