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Dual beam SEM/FIB (FEI Helios 600i)
Dual Beam SEM / FIB FEI Helios 600i
Contact :
Roland SALUT
Building TEMIS Sciences - Office N2-28
03 63 08 21 07 (Office)
03 63 08 20 11 (FIB room)
roland.salut@femto-st.fr
Location :
TEMIS clean-room
FIB room
Principle :
The dual beam SEM/FIB equipment (FEI Helios 600i) is composed of an electron column and an ion column; the angle between the two columns is 52 °. The eucentric stage is capable of moving the sample orthogonal to one or other of the two beams. Gas injectors (injection needle of a Pt-based precursor is shown here in blue) allow to assist milling or to make located deposition.
The electron/material interaction is described in the SEM tab. The ion/material interaction is schematically shown here. It leads to the sputtering of the material (main desired effect) and the emission of electrons but also the heating of the material and defect creation.
Technical characteristics :
Elstar UHR immersion lens FESEM column :
- Electrostatic scanning
- Constant power lens technology
- Fast beam blanker (5 MHz)
- Landing voltage 50 V – 30 kV
- Probe current up to 22 nA
Electron beam resolution @ optimum WD
- 0.9 nm @ 15 kV
- 1.4 nm @ 1kV
Tomahawk ion column :
- Up to 60 A.cm² beam current density
- 15 apertures (1 pA – 65 nA)
- Landing voltage 500 V – 30 kV
Ion beam resolution @ coincident point
- 4.5 nm @ 30 kV
High precision 5-axes motorized stage :
- XY : 150 mm x 150 mm, piezo driven
- Z : 10 mm
- T : -10° to +60°
- R : 360° endless, piezo driven
- Tilt accuracy (between 50 and 54°) : 0.1°
Detectors :
- Elstar in-lens SE detector (TLD-SE)
- Elstar in-lens BSE detector (TLD-BSE)
- Everhart-Thornley SE detector (ETD)
- High contrast BSE detector (DBS)
- SE and SI detector (ICE)
- IR Camera / NavCam
Gas Injection System :
- Platinum deposition
- Insulator deposition (SiOx)
- Enhanced etch (iodine)
- Insulator enhanced etch (XeF2)
Others :
- 3D reconstruction (slice & view)
- Flood Gun
Raith Elphy Multibeam :
- GDSII editor
- 50 ns min. dwell time
- Drift correction
- Overlay and stitching possible, accuracy function of used beam and field size
Achieved results :
