Research departments

Thick photoresists

Thick photoresists

• Thick photoresists for DRIE dry etching :

When you want to go through a silicon wafer (ie 500 microns) by dry etching method (DRIE), the resist mask must have a thickness of several microns (typically 6 microns). We use resists with viscosity about 25 times greater than 1µm-thick positive resists. For these steps, we use SPR 220 7.0 or AZ 9260 photoresists.

Structures gravées_Résines épaisses

Silicon structures etched through a AZ 9260 mask

• Thick photoresists for electroplating
: UV LIGA technology

One particular technique to fabricate micro-objects is to combine UV photolithography of a thick resist with the deposition of a metal by electroplating : this is the LIGA UV technology used in FEMTO-ST since 1993 *.

* W. Daniau, S. Ballandras, P. Berçot, D. Hauden « Metallic microdevices fabricated by deep-etch UV lithography », Materials Science and Engineering A160 p. L5-L8 1993.

The goal is to get a relatively thick object, so the polymer mold must be made with a viscous photoresist. For objects up to about 50 microns, we use AZ 9260 resist (viscosity : 520 cSt), and beyond the SU-8 2075 resist (viscosity : 22,000 cSt) and the KMPR 1050 resist (viscosity : 13 000 cSt).

To describe the resist and nickel patterns, we used  the term Aspect Ratio, defined by dividing the height of the pattern by its smaller width:

Facteur de forme_Résines épaisses1

The smallest theoretical width lmin that can be obtained is limited by the Fresnel diffraction:

Equation diffraction Fresnel_Résines épaisses

λ is the wavelength, g is the gap between the mask and the resist and h is the height of the resist.

The maximum theoretical aspect ratio that can be achieved for a resist pattern is thus given by:

Facteur de forme théorique

Here is the graph of this equation for a perfect contact (g = 0 and λ = 365 nm)

Facteur de forme_Résines épaisses_1

Maximum theoretical aspect ratio of a resist pattern according to its thickness
Up: up to 1 mm, bottom: up to 10 microns

Note that this aspect ratio concept is not reserved only for very thick photoesists and that can also be used for thin resists. But a successful high aspect ratio remains linked to the choice of tool used to structure the resist throughout its thickness.

Achieved results :

Résine AZ9260_Résines épaisses

AZ 9260 resist : thickness 60 µm

Résine SU8_Résines épaisses

SU-8 resist : thickness 100 µm
(optical microscope image)

Résine KMPR 1050_Résines épaisses

KMPR 1050 resist : thickness 210 µm, squares of 50 µm sides

Résine KMPR_2-Résines épaisses

KMPR 1050 resist coated on 2 levels : 750 µm (400µm for the first one and 350 for the second one)