The institute
PLASSYS Cathode sputtering / Evaporation
You are here
PLASSYS Cathode sputtering / Evaporation
PLASSYS Cathode sputtering / Evaporation : Plassys MP 400
Contact :
Alexandru TODORAN
TEMIS Sciences Building – Office N1-21
03 81 66 66 47 (Office)
03 63 08 23 77 (Deposition Area)
alexandru.todoran@femto-st.fr
Location :
TEMIS cleanroom
Deposition Area
Technical characteristics :
- Cathodes : three 4 inch magnetron cathodes (sputter up)
- Heating chuck (up to 450°C)
- Joule effect evaporation source
Deposited materials :
- Available targets : Cr, Au, Al, Ti, W and Cu
-
Alloy : Ni-Cr 50-50, AU4G (Al-Cu-Mg-Si alloy)
Examples :
- Au-Cr deposition for quartz wet etching
- W deposition (refractory material) for thermocouple
Last modified:
2017-10-04